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Graphene and Anti-reflective Coatings using Pulsed High-Current Arc Evaporation (Graphen)
In this project, an innovative process for the production of carbon-based, thin antireflection layers and graphene or graphene-like layers on different substrate materials for industrial use was realized. Carbon is used in sp2 hybridization (graphitic configuration) for both blackening of surfaces and graphene production. In this respect, the two production processes differ only slightly from each other. Therefore, it makes sense to use both applications with a coating line and thus to develop a high-performance coating cluster designed for a wide range of applications in order to open up new markets.

The starting point of the project was the urgent industrial need for different carbon-based high-performance coatings, both for surface treatment and as a surface protection layer. On the other hand, graphene and graphene-like layers are currently on the threshold of industrial breakthroughs. The technology roadmap recently published by a team of authors envisages integrating graphene into more than 20 different application areas by 2023. For this purpose, different methods for the industrial production of graphene are currently being qualified.

The aim of the project was the development of a process or a prototypical coating system with which it is possible to process different substrate materials reliably with high-performance carbon-based materials. Particular focus was placed on the development of a flexible process and thus the coverage of a large range of carbon functional layers in order to open the market as large as possible. The basis for this process is the technology of the magnetic filtered high-current arc (Φ-HCA), which is primarily developed by the Fraunhofer Institute IWS in Dresden and commercially marketed by Arc Precision GmbH in Wildau. The partners involved in the project are the photonics, laser and plasma technology working group in the Department of Engineering and Natural Sciences of the Technical University of Wildau (THWi), as well as the FAP Research and Application Laboratory Dresden Plasmatechnik GmbH (FAP).


cooperation partners:
AG Photonik, Laser- und Plasmatechnologien  FAP Plasmatechnik

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